MSP Model 2800, Liquid Injection, CVD Turbo Vaporizer
Process Advantages- Request a Quote
- Ultra high vapor quality created by efficient vaporization
- Very low particulate contamination
- Longer PM cycles and much lower consumable costs
- Higher deposited wafer throughput
- Superb film thickness repeatability, wafer to wafer
- ALD processes enabled using Hafnium Componde
- BPSG processes made with ozone assist using TEOS, TEPO and TEB
Features & Applications
The Turbo Vaporizer is the most advanced technology available to create a pure vapor, resulting in a much higher qualitydeposited film. The Turbo Vaporizer would replace existing liquid injection CVD vaporizers presently used in your CVD systems.
Today’s conventional liquid injection vaporizers have three key complaints by CVD device managers: CVD vaporizers have too much precursor degradation, which limits process development; PM consumable costs and down time is far too excessive causing MTBF issues; contamination is too high, lowering the anticipated CVD system yields.
MSP’s Model 2800 Turbo Vaporizer has been successfully tested and proven to overcome these disadvantages of today’s liquid injection and bubbler vaporizers. It is a small compact package which fits into the existing gas cabinet location, replacing the present liquid injection vaporizer and controller. Precursor degradation limits new device advancements, such as ALD and BPSG, which takes away the competitive edge of the device maker.
High PM costs lead to a number of unwanted consequences, such as;
- Unwanted high material costs of operation
- Low CVD equipment reliability
- Low CVD wafer throughput
- High labor overhead to maintain the conventional vaporizers in each CVD system
Liquid contact with the hot walls of today’s CVD vaporizers, causes the liquid to decompose, creating particulate contamination. This leads to obstructing the vapor output, which introduces high PM consumable costs, increased labor costs to support the PM and higher consumption of precursor liquids. Today’s liquid injection vaporizers have a very high cost of PM due to a high consumable parts cost and short periods of production time between each PM action. The MSP Turbo Vaporizer has been designed to counter these disadvantages.
MSP has truly advanced direct liquid injection vaporizer technology with a well thought out aerosol solution, combined with a superb liquid MFC from Brooks Instruments. The Brooks LMFC has the unique capability to measure fluid mass directly, independent of physical properties of the fluid, thus eliminating the need to use conversion factors required for conventional thermal measurements. Vaporizers that support CVD applications need to provide an efficient vaporization in order to sustain the quality of the vapor, and the resulting deposited films. The Model 2800 Turbo Vaporizer is uniquely able to create a low temperature vapor from direct injection. As long as the CVD system can efficiently introduce the high quality vapor to the wafer surface, the deposited film quality will be superb, compared to your present deposited film quality.
The internal design of the MSP Turbo Vaporizer achieves a high quality vapor with extremely low contamination rates, low PM maintenance costs, low technical support requirements; thus, the Turbo Vaporizer provides the desired high quality vapor with resulting low CVD system maintenance, much lower PM consumables cost and high CVD system throughput. Film thickness repeatability from wafer to wafer has also been improved, even when approaching 30 angstrom thicknesses.
Conclustion
Customer feedback on film quality, consumption of chemical precursor , PM, contam ination levels, CVD maintenance is very good indeed!- The consumption rate of precursor liquid is lower, resulting in a savings of precursor liquid
- The particulate contamination levels are drastically reduced, resulting in yield improvements
- No un-vaporized liquids are found on the deposited film, again resulting in improved yield
- CVD wafer throughput has increased due to improved deposition rates and improved PM cycles
- MTBA and MTBF is significantly improved, reducing PM parts cost and system downtime
- Vapor quality has been significantly improved, resulting in a competitive edge on ALD and BPSG processes
The device customers presently using the Turbo Vaporizer are confirming that due to improved vaporization capabilities, the Model 2800 is providing a far superior vapor quality to the CVD system, thus the deposited film quality is far better than what traditional vaporizers provide today. Customer responses are not published, as they do not wish to convey any advantages they have over their competitors. Customers who are testing the Turbo Vaporizer have begun to implement the Turbo Vaporizer into production. It is an important transition for the semiconductor industry, but again, device companies will not publicly make a statement. 3 rd party acquaintances to the present installed base are getting excellent vaporizer process feedback, which is causing 3 rd party CVD managers to call MSP and implement Turbo Vaporizer evaluations.
Other materials besides TEOS and BPSG are Hafnium Componde, which is required to develop the ALD (atomic layer deposition) process. TEOS is typically used with ozone-assist to make un-doped silica glass (USG). TEOS with TEPO is also used with ozone assist to make phosphorous silica glass (PSG). BPSG is also made with ozone assist using TEOS, TEPO and TEB.