Silica nanoparticles, Silica powder, laser particle counter, KLA-Tencor Surfscan, CMP Slurry, Optical Lens Polishing, Chromatography

Applied Physics, Inc.

REQUEST A QUOTE

Applied Physics, Inc.

Call Us: 1-720-635-3931

Wafer Standards

Clean Room Foggers

Nitrogen Foggers

PSL Spheres, Silica Particles


MSP Corp.

Aerosol Products

Silica Nanoparticles for Size Calibration; Silica Powder used in CMP Slurry, Optical Polishing and Chromatography

Silica nanoparticles are NIST Traceable, spherical and mixed in 15ml of Di Water Solution with 10% concentration of Silica. The CV is quite narrow at very specific sizes from 40nm to 2 microns, providing a monodisperse, particle size distribution.

Silica Particles, Nano-Particles, Silica Bulk Powder - Request a Quote

Applied Physics provides Silica nanoparticles for particle wafer calibration standards; as well as bulk Silica for industry requirements such as Portland cement, CMP slurries, Chemical Mechanical Polish, CMP and optical lens polish. Wafer Inspection Systems, SSIS, such as KLA-Tencor SP1, KLA-Tencor SP2, TopCon, ADE and Hitachi Wafer Inspection Systems can use SiO2 particles for size calibration. Silica Nanoparticles are provided in sizes from 40nm to 2 microns to calibrate the size response curves of the respective wafer inspection systems and laser particle counters. Industries providing Portland cement, CMP slurries, pharmaceutical drug delivery use silica nanoparticles from 2um to 30um. Silica particles are made to very tight and accurate size peaks to support lens polish, cmp polish, size calibration etc. Silica particles are spherical and man made to specific diameters, where as most other process particles are non-spherical.

Industrial Applications Include:

Semiconductor, Silica Nanoparticles, Contamination Wafer Standard

High Pressure, Liquid Chromatography

CMP Slurry, Silicon Wafer Polishing

Pharmaceutical Drug Delivery and mesoporous silica nanoparticles (MSN)

Thin Film, Solar Cell Manufacturing

Nano-Composites

SSIS (Scanning Surface Inspection Systems) and Aerosol Particle Counter size calibration

High Pressure, Liquid Chromatography

Portland Cement and Cement manufacturing

Silica SPHERICAL Particles, 40nm to 3um, typical sizes below. Bulk, Dry Powder Silica is ordered in 2kg increments.

 

 

Product Part #

Liquid Volume

Mean Peak

Size Uniformity (CV)

Solids Content

 AP-Silica-40nm

15ml DIH2O & 10% Concentration 

 40nm

 ≤ 3%

10%

 AP-Silica-50nm

15ml DIH2O & 10% Concentration 

 50nm

 ≤ 3%

10%

 AP-Silica-60nm

15ml DIH2O & 10% Concentration 

 60nm

 ≤ 3%

10%

 AP-SiO2-70nm

15ml DIH2O & 10% Concentration 

 70nm

 ≤ 3%

10%

 AP-Silica-80nm

15ml DIH2O & 10% Concentration 

 80nm

 ≤ 3%

10%

 AP-Silica-90nm

15ml DIH2O & 10% Concentration 

 90nm

 ≤ 3%

10%

 AP-Silica-100nm

15ml DIH2O & 10% Concentration 

 100nm

 ≤ 2.5%

10%

 AP-Silica-102nm

15ml DIH2O & 10% Concentration 

 102nm

 ≤ 2.5%

10%

 AP-Silica-125nm

15ml DIH2O & 10% Concentration 

 125nm

 ≤ 2.5%

10%

 AP-Silica-130nm

15ml DIH2O & 10% Concentration 

 130nm

 ≤ 2.5%

10%

 AP-Silica-140nm

15ml DIH2O & 10% Concentration 

 140nm

 ≤ 2.5%

10%

 AP-Silica-150nm

15ml DIH2O & 10% Concentration 

 150nm

 ≤ 2%

10%

 AP-Silica-160nm

15ml DIH2O & 10% Concentration 

 160nm

 ≤ 2%

10%

 AP-Silica-170nm

15ml DIH2O & 10% Concentration 

 170nm

 ≤ 2%

10%

 AP-Silica-180nm

15ml DIH2O & 10% Concentration 

 180nm

 ≤ 2%

10%

 AP-Silica-190nm

15ml DIH2O & 10% Concentration 

 190nm

 ≤ 1.5%

10%

 AP-Silica-200nm

15ml DIH2O & 10% Concentration 

 200nm

 ≤ 1%

10%

 AP-Silica-225nm

15ml DIH2O & 10% Concentration 

 225nm

 ≤ 1%

10%

 AP-Silica-269nm

15ml DIH2O & 10% Concentration 

 269nm

 ≤ 1%

10%

 AP-Silica-300nm

15ml DIH2O & 10% Concentration 

 300nm

 ≤ 1%

10%

 AP-Silica-325nm

15ml DIH2O & 10% Concentration 

 325nm

 ≤ 1%

10%

 AP-Silica-350nm

15ml DIH2O & 10% Concentration 

 350nm

 ≤ 1%

10%

 AP-Silica-400nm

15ml DIH2O & 10% Concentration 

 400nm

 ≤ 1%

10%

 AP-Silica-450nm

15ml DIH2O & 10% Concentration 

 450nm

 ≤ 1%

10%

 AP-Silica-500nm

15ml DIH2O & 10% Concentration 

 500nm

 ≤ 1%

10%

 AP-Silica-600nm

15ml DIH2O & 10% Concentration 

 600nm

 ≤ 1%

10%

 AP-Silica-700nm

15ml DIH2O & 10% Concentration 

 700nm

 ≤ 1%

10%

 AP-Silica-800nm

15ml DIH2O & 10% Concentration 

 800nm

 ≤ 1%

10%

 AP-Silica-895nm

15ml DIH2O & 10% Concentration 

 895nm

 ≤ 1%

10%

 AP-Silica-1000nm

15ml DIH2O & 10% Concentration 

 1000nm

 ≤ 1%

10%

 AP-Silica-1019nm

15ml DIH2O & 10% Concentration 

 1019nm

 ≤ 1%

10%

 AP-Silica-1500nm

15ml DIH2O & 10% Concentration 

 1500nm

 ≤ 1%

10%

 AP-Silica-2000nm

15ml DIH2O & 10% Concentration 

 2000nm

 ≤ 1%

10%

 AP-Silica-3000nm

15ml DIH2O & 10% Concentration 

 3000nm

 ≤ 1%

10%

Silica Nanoparticles, Benefits:

Repeatable, batch to batch, Silica particle Diameter size

Silica nano-particles are spherical in design and very uniform in size

Typical 2% Peak Size Distribution Width above 100nm

40nm to 3um Sizes available with 15ml of Di Water and 10% SiO2 concentration

40nm to 30um Sizes available in 2Kg increments of Dry Silica nanoparticles

Ultra-High Size Purity of 99.997 percent

Refractive Index of SiO2 (n=1.46), very close to Polystyrene Latex (n=1.585) @ 633nm laser wavelength

Calibration Curves between SiO2 and PSL Spheres is cose, allowing highly accurate, SiO2 size calibration

Silica Nanoparticles can be ordered in dry powder form from 1 Kg to 200 Kg in support of CMP slurry processes, cement manufacturing, lens polishing, etc.; or in DI Water solution in 15ml bottles with 10% concentration of Silica. Call Applied Physics at 720-635-3931.

Wafer Inspection Systems, referred to as Scanning Surface Inspection Systems, SSIS, most notably the Surfscan tools from KLA-Tencor and SSIS tools from Hitachi and Topcon, can be better calibrated using SiO2 particles, because the refractive index of SiO2 is equivalent to PSL Sphere refractive index, thus calibration between PSL Spheres and Silica nano-particles is quite similar. More importantly, the Silica nanoparticles much more robust to applications using high powered lasers such as the KLA-Tencor SP3, SP5 and SPx wafer inspection systems. Silica particles can be ordered by calling Applied Physics at 720-635-3931.

SiO2 nano-particles provide a very close refractive index to Polystyrene latex beads and are more durable in use with high powered lasers, and the Particle Wafer Standards produced using Silica are even longer lasting than with PSL Spheres.

Silica particles come in two versions: bulk dry powder in 1Kg or larger volumes with sizes ranging from 2 microns to 30 microns; or in DI Water (distilled water) solutions with 15ml volume and 10% concentration with sizes ranging from 40nm to 2 microns. The use of Silica for SSIS size calibration and Laser Particle Counter, LPC, size calibration is superb, because the Silica particles will not shrink in size when scanned for size calibration by high power lasers used in SSIS and LPC instruments today. SiO2 particle sizes typically requested for SSIS and LPC calibration are 32nm, 40nm, 50nm, 60nm, 70nm, 80nm, 100nm, 125nm, 150nm, 200nm 250nm, 300nm, 400nm, 500nm, 600nm, 750nm, 800nm, 1000nm, 2000nm and 3000nm

SiO2 Particles