Calibration Wafer RFQ

Calibration Wafer RFQ

Calibration Wafer RFQ

Calibration Wafer RFQ Needing something other than a Calibration Wafer?

Contact AP:

Tel #: (719) 428-4042, Cel #: 303-999-6837

Skype: ap-jturner

Applied Physics, Inc.

400 N County Road 2 East, Monte Vista, CO 81144  USA

PSL Wafer RFQ
First
Last

Wafer #1


Wafer #2


Wafer #3


Wafer #4


Wafer #5

Calibration Wafer RFQ Wafer Options

Wafer Size
75mm, 100mm, 90mm, 150mm, 200mm, 300mm
Approximate PSL Count
2500 for Spot Dep; 5000, 10000, 20000 for Full Dep
Certified
Deps are NIST Traceable, Size Certificate Included
Substrate Material
Prime Silicon, Customer Film Wafer, 150mm Blank Mask
PSL Sizes
SC refers to SurfCal Sizes; * sizes close to NIST SRM Standards
40nm Certified Mean Peak: 40 nm ± 1 nm
50nm Certified Mean Peak: 46 nm ± 2 nm
SC7nm, SurfCal Certified Mean Peak 47 nm ± 4 nm
60nm Certified Mean Peak: 60 nm ± 4 nm
SC64nm, SurfCal Certified Mean Peak 64 nm ± 3 nm
70nm Certified Mean Peak: 70 nm ± 3 nm
80nm Certified Mean Peak: 81 nm ± 3 nm
SC83nm, SurfCal Certified Mean Peak 83 nm ± 4 nm
92nm Certified Mean Peak: 92 nm ± 3 nm
SC92nm, SurfCal Certified Mean Peak 92 nm ± 4 nm
* 100nm Certified Mean Peak: 100 nm ± 3 nm
SC100nm, SurfCal Certified Mean Peak 100 nm ± 3 nm
90nm Certified Mean Peak: 90 nm ± 3 nm
SC126nm, SurfCal Certified Mean Peak 126 nm ± 3 nm
150nm Certified Mean Peak: 147 nm ± 3 nm
SC155nm, SurfCal Certified Mean Peak 155 nm ± 3 nm
SC202nm, SurfCal Certified Mean Peak 202 nm ± 4 nm
200nm Certified Mean Peak: 203 nm ± 5 nm
SC204nm, SurfCal Certified Mean Peak 204 nm ± 4 nm
216nm Certified Mean Peak: 216 nm ± 4 nm
SC220nm, SurfCal Certified Mean Peak 220 nm ± 3nm
240nm Certified Mean Peak: 240 nm ± 5 nm
* 269nm Certified Mean Peak: 269 nm ± 5 nm
300nm Certified Mean Peak: 296 nm ± 6 nm
SC304nm, SurfCal Certified Mean Peak 304 nm ± 4 nm
350nm Certified Mean Peak: 350 nm ± 6 nm
SC360nm, SurfCal Certified Mean Peak 360 nm ± 5 nm
400nm Certified Mean Peak: 400 nm ± 9 nm
450nm Certified Mean Peak: 453 nm ± 9 nm
495nm Certified Mean Peak: 496 nm ± 8 nm
SC498nm, SurfCal Certified Mean Peak 498 nm ± 6nm
500nm Certified Mean Peak: 498 nm ± 9 nm
565nm Certified Mean Peak: 565 nm ± 9 nm
600nm Certified Mean Peak: 600 nm ± 9 nm
700nm Certified Mean Peak: 707 nm ± 9 nm
800nm Certified Mean Peak: 799 nm ± 9 nm
802nm SurfCal Certified Mean Peak 802 nm ± 9 nm
809nm SurfCal Certified Mean Peak 809 nm ± 6 nm
900nm Certified Mean Peak: 903 nm ± 12 nm
994nm Certified Mean Peak 994 nm ± 21 nm
1um Certified Mean Peak 1.019 μm ± 0.015 μm
1.1um Certified Mean Peak 1.101 μm ± 0.017 μm
1.1um SurfCal Certified Mean Peak 1.112 μm ± 0.011 μm
1.4um Certified Mean Peak 1.361 μm ± 0.015 μm
1.6um Certified Mean Peak 1.587 μm ± 0.018 μm
1.6um SurfCal Certified Mean Peak 1.59 μm ± 0.016 μm
1.8um Certified Mean Peak 1.745 μm ± 0.022 μm
2um Certified Mean Peak 1.999 μm ± 0.020 μm
2um SurfCal Certified Mean Peak 2.01 μm ± 0.019 μm
2.5um Certified Mean Peak 2.504 μm ± 0.027 μm
3um Certified Mean Peak 3.002 μm ± 0.019 μm
3um SurfCal Certified Mean Peak 3.04 μm ± 0.026 μm
4um Certified Mean Peak 4.000 μm ± 0.043 μm
5um Certified Mean Peak 4.993 μm ± 0.040 μm
6um Certified Mean Peak 6.007 μm ± 0.040 μm
7um Certified Mean Peak 6.982 μm ± 0.045 μm
8um Certified Mean Peak 7.979 μm ± 0.075 μm
9um Certified Mean Peak 8.956 μm ± 0.082 μm
10um Certified Mean Peak 10.00 μm ± 0.08 μm
12um Certified Mean Peak 12.01 μm ± 0.11 μm

Calibration Wafer RFQ Full Wafer Deposition – Request a Quote

Calibration Wafer RFQ Full Deposition, Calibration Wafer Standards are also called PSL Wafer Standards. A Full Deposition wafer is normally deposited with a uniform particle count per centimeter squared across the wafer. This is a general count uniformity across the wafer, but is not exact. Count accuracy between two different wafer inspection tools can differ as much as 50% because the two wafer inspections may have two different lasers with different laser power, different beam widths, different laser power uniformity, Calibration Wafer RFQ etc. All of these elements affect count accuracy; thus count accuracy can not be a specification. The function of a FULL Deposition wafer standard is to calibrate size accuracy at one particle size, and to see how uniformly the SSIS tools scans across the wafer. For example, if a wafer standard has an average count of 100 particles per centimeter squared at 0.1 microns, then if the SSIS tool provides a similar, uniform detection of particles across the wafer, it is describing the uniform detection response of the calibration. Calibration Wafer RFQ On the other hand, if the SSIS tool has a blank spot or blank spots, where no detection is noted, then a FULL Deposition wafer standard helps to describe a poor scan response of the SSIS tool. Calibration Wafer RFQ