Calibrating for the Angstrom Era with Sub-20nm PSL Spheres
As semiconductor fabrication moves beyond the 3nm node and enters the Angstrom era, the margin for error in contamination control has effectively vanished. At these scales, a single particle smaller than 20 nanometers can result in a catastrophic killer defect on a wafer. To maintain high yield rates, metrology tools must be calibrated with absolute […]
