Particle Contamination on Silicon Wafers and Film-Deposited Wafers: What IC Fabs Must Know
Particle contamination on silicon and film-deposited wafers occurs when unwanted nano- or micro-scale particles settle on wafer surfaces during semiconductor processing. These particles can disrupt lithography, seed defects in deposited films, and reduce yield—especially at advanced process nodes. Effective contamination control depends on accurate inspection, proper tool calibration, and an understanding of how wafer surfaces […]
5μm to 2000μm: The Ultimate Guide to NIST-Traceable Glass Particle Standards by Applied Physics
Introduction to Glass Particle Standards Applied Physics Corporation’s 9000 Series Borosilicate Glass Particle Standards represent the gold standard in calibration materials for scientific and industrial applications. These highly uniform glass microspheres provide researchers and quality control professionals with NIST-traceable standards essential for precise instrument calibration and consistent experimental results. The comprehensive size range from 5μm […]
