Optimizing Sputtering Gas Composition for Nitride Film Hardness
Nitride thin films, such as Titanium Nitride (TiN) and Chromium Nitride (CrN), are essential for extending the lifespan of industrial tools, but achieving maximum hardness requires precise control over the deposition environment. The composition of the sputtering gas, specifically the ratio of inert Argon to reactive Nitrogen, dictates the stoichiometry, microstructure, and ultimate mechanical properties […]
Implementing Closed-Loop Process Control in Sputter Deposition Systems
Sputter deposition is the backbone of modern semiconductor and coating industries, used to create everything from optical filters to conductive layers on touchscreens. While DC sputtering of metals is relatively straightforward, reactive sputtering, adding a reactive gas like oxygen or nitrogen to form a compound,s introduces significant instability. To maintain high deposition rates and stoichiometric […]
