Optimizing Sputtering Gas Composition for Nitride Film Hardness
Nitride thin films, such as Titanium Nitride (TiN) and Chromium Nitride (CrN), are essential for extending the lifespan of industrial tools, but achieving maximum hardness requires precise control over the deposition environment. The composition of the sputtering gas, specifically the ratio of inert Argon to reactive Nitrogen, dictates the stoichiometry, microstructure, and ultimate mechanical properties […]
