Beyond PSL: The Growing Importance of Silica Wafer Standards in Sub-20nm Node Metrology
As the semiconductor industry aggressively scales toward 7nm, 5nm, and even smaller process nodes, the precision required for contamination monitoring has reached an inflection point. For decades, Polystyrene Latex (PSL) microspheres have served as the industry gold standard for calibrating Scanning Surface Inspection Systems (SSIS). However, as particle size detection requirements drop below the 20nm […]
