clean room fogger, high purity fogger, ultrapure fogger, nitrogen fogger, PSL calibration wafer standards, silica nanoparticles, polystyrene latex beads, surface functionalized silica and hydrophobic silica

Applied Physics, Inc.

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PSL Wafer Standards

Calibration Wafer Standards

Contamination Wafer Standards

Particle Wafer Standards

Clean Room Foggers

Ultrapure Foggers

PSL Spheres, Polystyrene Latex Beads

Silica Nanoparticles in Di Water

Commercial Monosilicate

Functionalized Silica

Smoke Studies to Visualize Airflow Turbulence

Call Applied Physics, Inc.

1-720-635-3931


Applied Physics, Inc. provides calibration wafer standards, silica contamination wafer standards and PSL Wafer standards for size calibration of Tencor Surfscan 6200, 6220, 6400 and 6420 wafer inspection tools; as well as KLA-Tencor Surfscan SP1, SP2, SP3, SP5 and SP5xp tools. Clean room foggers, high purity foggers, ultrapure foggers, CO2 foggers and portable, battery operated foggers are provided for airflow visualization and smoke studies in sterile rooms, ISO suites, medical rooms, barrier isolators and clean rooms. Ultrapure cleanroom foggers are used in airflow smoke studies in pharmaceutical, medical and semiconductor facilities. Deionized water (DI water) or water for injection (WFI) is combined with liquid nitrogen to produce 5 cubic meters of ultrapure fog with high density for 20 feet airflow visibility. Cleanroom foggers are designed to visualize airflow to locate dead zones, turbulence, airflow imbalance and patterns using a high purity, non-contaminating fog; which requires no cleanup. Room decontamination of harmful organisms in ISO suites, sterile rooms and compound pharmacies is provided using a Dry Fogger. Functionalized silica, hydrophobic silica is available for polymer filler from 1-1000Kg. Contact Applied Physics, Inc. at TEL: 1-720-635-3931.

Contamination Wafer Standards are certified, particle wafer standards deposited with NIST Traceable, monodisperse, silica nano-particles between 40nm and 2 microns. The Contamination Wafer Standard can be deposited as a full deposition or spot deposition on a prime silicon wafer with a narrow size peak. 40 nanometer to 2um particle wafer standards can be provided with 1 or more spot depositions around the wafer with a controlled particle count between 1000 and 2500 per size deposited. Full Deposition across the wafer is also provided with particle counts ranging from 5000 to 10000 particles across the wafer. Silica Contamination Wafer Standards are used to calibrate the size accuracy response of scanning surface inspection systems (SSIS) using high powered lasers, such as KLA-Tencor SP2, SP3, SP5, SP5xp and Hitachi wafer inspection tools.
Calibration Wafer Standards are certified, NIST traceable, PSL wafer standards deposited with monodisperse, polystyrene latex spheres between 40nm and 10 microns. A PSL Wafer Standard can be provided with a spot deposition with controlled particle count between 1000 and 2500 per size deposited. A Full Deposition is a single size deposition across the entire wafer surface with a PSL count between 5000 and 25,000 count, depending on diameter of wafer standard. Calibration Wafers are used to calibrate the size accuracy response of scanning surface inspection systems (SSIS) using low powered lasers, such as Tencor 6200, Tencor 6220, Tencor 6400 and 6420, KLA-Tencor SP1, SP2 and Hitachi wafer inspection tools.
Clean Room Foggera smoke generator using DI Water or WFI water to produce 9cfm of pure fog with 'on demand' fog control for about 60 minutes. No contamination of any kind is created and no clean up is required. Clean room airflow, turbulence, patterns and balance of airflow in smoke studies of Pharmaceutical ISO suites, sterile rooms and barrier isolators, which is a requirement of USP 797 Pharmaceutical In-Situ Airflow Analysis.
Cleanroom Ultrapure Fogger uses liquid nitrogen and Deionized Water or WFI water, Water for Injection to create a very dense, ultrapure fog to provide superb visualization of airflow patterns, direction, turbulence, dead zones and velocity for up to 90 minutes in clean rooms, ISO suites, sterile rooms, barrier isolators and medical rooms. Adjustable fog output is provided from 2 to 5 CUBIC METERS per minute of ULTRAPURE FOG with more than 20 feet visualization of turbulence in the airflow and around equipment, as well as 3D airflow modeling. No contamination is created and no clean up of any kind is required after visualizing the airflow.
CO2 Fogger is a smoke machine using DI Water and CO2 Ice to provide a dense fog of about 6cfm for 8-10 minutes to visualize airflow in ISO suites and sterile rooms. A CO2 fogger works well to video smoke studies and describe airflow, patterns and turbulence in Pharmaceutical ISO suites guided by USP 797 Pharmaceutical In-Situ Airflow Analysis. No clean up is required after CO2 fog evaporation.
DI Water Fogger is a portable clean room fogger providing airflow visualization of turbulence and dead spots in clean rooms, sterile rooms and IOS suites. No contamination is created and no clean up afterwards is required. Distilled Water or Water for Injection (WFI) is converted to a pure fog vapor for about 60 minutes at 9cfm fog volume to support guidelines for semiconductor clean rooms and USP 797 Pharmaceutical in-situ airflow analysis.
Polystyrene Latex Spheres are NIST Traceable, polystyrene latex beads from 20 nanometers to 160 microns. PSL Spheres are highly accurate, size standards with a narrow particle size distribution, suspended in a DI Water solution with a trace surfactant to minimize agglomeration. Polystyrene latex beads are used to create a particle aerosol to challenge the size accuracy of laser particle counters or to produce PSL Wafer standards.
Silica Nanoparticle Size Standards are spherical and mixed in 15ml of Di Water solution with 10% concentration of Silica. CV is quite narrow with sizes provided from 20nm to 3 microns, providing a mono-disperse particle size distribution. Functionalized silica, hydrophobic silica and silica nanoparticles used as polymer filler available from 1-1000Kg.
Room Sanitizer is used to decontaminate ISO Suites, sterile rooms, compound pharmacies and leaf plants by saturating the room space with an aerosol of hydrogen peroxide nano-droplets, evaporating to a vapor to contact every part of the room to kill off 99.9997% of bio-contamination. USP 1072 recommends a daily bactericidal disinfectant with a weekly or monthly use of a sporicidal agent.
VIDEO HIGHLIGHTS
  Cleanroom Ultrapure Fogger Clean Room Fogger Microbial Air Sampler  
Clean Room Ultrapure Fogger Clean Room Fogger Microbial Air Sampler
Clean Room Fogger, DI water fogger, Cleanroom Ultrapure Fogger, Nitrogen Fogger, Portable Fogger; all are used to visualize airflow, patterns, dead zones and turbulence in smoke studies of clean rooms, sterile rooms, barrier isolators and ISO suites. Guidelines for ISO 14644-3 ANNEX B7, USP 797 Insitu Airflow Analysis and Semiconductor clean rooms are supported. The Microbial Air Sampler is used to monitor unwanted fungal and bacterial growth in ISO 5, ISO 7 and ISO 9 Filling Lines.
PRODUCT HIGHLIGHTS
 

Our 2300XP1 Particle Deposition System deposits PSL Spheres and silica nanoparticles on prime silicon wafers, blank photo masks or your film wafers to produce calibration wafer standards from 40 nanometers to 10 microns to calibrate the size accuracy response of Tencor, KLA-Tencor, Hitachi and Topcon wafer inspection systems. Silica nano-particles have nearly the same refractive index as PSL spheres, thus Silica nonoparticle, laser response is quite similar to PSL laser response. Glass substrates can be deposited from 1 micron to 10 microns to support size calibration of Rudolph tools.

The CRF-2 Clean Room Fogger is the lowest cost clean room fogger using DI Water or WFI Water to produce a pure fog at 9cfm for about 60 minutes. The CRF-2 uses a light weight, white, polypropylene enclosure to reduce costs. Ultrapure clean room foggers, called nitrogen fog generators, produce the highest volume of ultra pure fog, providing an ADJUSTABLE fog volume of 2-5 cubic meters per minute for up to 90 minutes with more than 20 feet visible airflow.

Cleanroom Fogger, Ultrapure Fogger, Nitrogen Fogger

Clean room Fogger Clean room foggers and ultrapure foggers are smoke generators used in smoke studies to visualize airflow and turbulence with a high purity fog in Class 1 to Class 100,000 clean rooms, sterile rooms and ISO suites. The Cleanroom Ultrapure Fogger provides an adjustable fog output from 2-5 cubic meters per minute for up to 90 minutes with 20 feet or more of visible airflow for smoke studies and 3D airflow modeling in clean rooms, ISO suites and sterile rooms. No other ultrpure fogger is capable of this fog volume. The CRF-2 CleanRoom Fogger is designed as a LOW COST, DI Water Fogger to visualize airflow providing 9cfm of fog for 60 minutes.

Clean Room Fogger, CRF-2 Information

PSL Wafer Standard, Calibration Wafer Standard

Calibration Wafer Standard PSL Calibration Wafer Standard is produced on Prime Silicon Wafers, your FILM Wafers or bare masks. NIST traceable, Polystyrene Latex (PSL) Spheres are used to produce, Calibration Wafer Standards, provided from 40nm to 10um on 100mm to 300mm wafers for calibration of KLA-Tencor Surfscan SP1, SP2, SP3, SP5, SP5xp; Tencor 6200, 6400 and 6420 systems; Topcon, ADE and Hitachi wafer inspection systems. These standards are provided with a single PSL Sphere particle size deposited as FULL Wafer Deposition across the wafer or deposited with multiple Polystyrene latex sphere size peaks, deposited as spot depositions around the prime silicon wafer, film wafer, glass substrate or photo mask surface.

Calibration Wafer Standard Information

   

PSL Spheres, Polystyrene Latex Beads, Commercial Monosilicate, Functionalized Silica

PSL Spheres PSL Spheres and polystyrene latex beads typical 1% concentration in 15ml DI Water; or Surf-Cal, pre-mixed PSL Spheres.
Commercial Monosilica in 1Kg increments. Bulk, Dry Powder silica, commercial silicate, functionalized silica, filler in polymers, CMP slurries, nano-composites, high pressure liquid chromatography and mesoporous silica nanoparticles (MSN). Silica Nanoparticles in 15ml of DI Water Solution for size calibration from 20nm to 2 microns. Functionalized silica, hydrophobic silica, silica for polymer filler available in 1-1000 Kg increments.

Silica Nano-Particles Information

DryFog, Disinfectant, Room Sanitizer

Room SanitizerDry Fog, Room Sanitizer provides superb decontamination of bacterial and fungal growth in a compound pharmacy, as well as ISO 5, ISO 7 and ISO 9 Pharmaceutical suites. The Dry Fogger is designed to kill microbiological contamination in compound pharmacies, pharma ISO suites. This sanitizing fogger produces a sporicidal agent as an aerosol, bactericidal disinfectant; which then evaporates to a vapor and spreading throughout a room to kill more than 99.997% of fungi and bacteria. For use in ISO suites, sterile rooms and compound pharmacies. 700+ DF2S disinfectant machines now used in the pharmaceutical market.

Room Sanitizer, Room Decontamination Information

   

CO2 Fogger and Battery Powered, Portable Fogger

CO2 Fogger CO2 Foggers provide portability and no power cords for smoke studies to visualize airflow and turbulence in Class 1 to 100,000 clean rooms, sterile rooms and ISO suites. The CO2 Fogger is a low cost fogger producing fog using CO2 ice and warm water to produce highly visible airflow with a typical 10 minute operating cycle. The CO2 fogger provides portability and does not require a power cord during operation. CO2 Foggers are typically used in rooms where no power access is provided.

CO2 Fogger Portable, CO2 Fogger, Information

Silica, Contamination Wafer Standard, Particle Wafer Standard

Contamination Wafer Standard Silica Contamination Wafer Standards are produced on Prime Silicon Wafers, your film wafers or blank masks. NIST traceable, Silica nanoparticles, Contamination Wafer Standards deposited with silica nano-particles are provided from 40nm to 2um on 150mm to 300mm wafers to calibrate KLA-Tencor Surfscan SP2, SP3, SP5, SP5xp; Tencor 6200, 6400 and 6420 systems; Topcon, ADE and Hitachi wafer inspection systems. These standards are provided with a single silical particle size deposited as FULL Wafer Deposition across the wafer or deposited with multiple silica nanoparticle size peaks, deposited as spot depositions around the prime silicon wafer, film wafer, glass substrate or photo mask surface.

Silica Calibration Wafer Standard Information