clean room fogger, Ultrapure fogger, nitrogen fog generator, silica nanoparticles, polystyrene latex spheres, PSL and Silica wafer standards

Applied Physics, Inc.

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Applied Physics, Inc.

Call Us: 1-720-635-3931

Wafer Standards

Clean Room Foggers

Nitrogen Foggers

PSL Spheres, Silica Particles


MSP Corp.

Aerosol Products

Applied Physics, Inc. provides contamination wafer standards, silica wafer standards and PSL Wafer standards for Semiconductor Metrology Managers. Cleanroom foggers are provided for airflow visualization of Pharmaceutical sterile rooms, ISO suites, barrier isolators and clean rooms. Contact Applied Physics at TEL: 1-720-635-3931. Smoke machines refer to a DI Water Fogger, CO2 fogger, clean room fogger, liquid nitrogen fogger, nitrogen fog generator, demiwater fogger or ultrapure fogger; all which are designed to visualize airflow. Battery operated, portable foggers are also available. Room sanitizers provide decontamination of harmful organisms in ISO suites, sterile rooms and compound pharmacies by saturating a controlled space with a hydrogen peroxide solution. ÅP™ is a trademark of Applied Physics, Inc.

Contamination Wafer Standard is a Certified, NIST Traceable, Size Standard with silica nano-particles deposited on a prime silicon wafer at a specific size peak with narrow size distribution. 40 nanometer to 2um particle wafer standards are provided with 1 or more spot depositions around the wafer with a controlled surface count between 1000 and 2500 per size deposited. Full Deposition across the wafer is also available with particle counts ranging from 5000 to 10000 particles. Contamination Wafer Standards are used to calibrate the size accuracy response of scanning surface inspection systems (SSIS), such as KLA-Tencor SP2, SP3, SP5, SPx, SEM tools and TEM tools using high powered lasers for detection of surface particle contamination.
Calibration Wafer Standard is a Certified, NIST Traceable, size standard deposited on a prime silicon wafer with polystyrene latex spheres at specific PSL Sphere sizes and narrow size distribution between 40nm and 10um. A PSL Wafer Standard can be provided with a spot deposition or multiple spot depositions with controlled particle count between 1000 and 2500 per size deposited. A Full Deposition is a single size deposition across the entire wafer surface with a PSL count between 5000 and 25,000, depending on diameter of wafer. Calibration Wafer Standards are used to calibrate the size accuracy response of scanning surface inspection systems (SSIS) using low powered lasers, such as Tencor 6200, Tencor 6220, Tencor 6400 and 6420, as well as KLA-Tencor SP1.
Clean Room Fogger often referred to as a smoke generator or smoke machine, uses DI Water or WFI water to produce 9cfm of pure fog with on demand fog control for about 60 minutes. No contamination of any kind is created and no clean up is required. Clean room airflow, turbulence, patterns and balance of airflow in smoke studies of Pharmaceutical ISO suites, sterile rooms and barrier isolators, which is a requirement of USP 797 Pharmaceutical In-Situ Airflow Analysis.
Cleanroom Ultrapure Fogger uses liquid nitrogen and Distilled Water or WFI water to create a very dense, ultra pure fog providing superb airflow visualization of patterns, direction, turbulence, dead zones and velocity for long periods of time in Semiconductor clean rooms, Pharmaceutical ISO suites, sterile rooms and barrier isolators. No contamination is created and no clean up of any kind is required after fogging the clean room.
CO2 Fogger is a smoke generator using DI Water and CO2 Ice for airflow visualization to produce a dense fog of about 6cfm for 8-10 minutes. A CO2 fogger works well to video smoke studies and describe airflow, patterns and turbulence in Pharmaceutical ISO suites guided by USP 797 Pharmaceutical In-Situ Airflow Analysis. No clean up is required after CO2 fog evaporation.
DI Water Fogger is a portable clean room fogger for airflow visualization of clean room air, patterns and turbulence. No contamination is created and no clean up afterwards is required. Distilled Water or Water for Injection (WFI) is converted to a pure fog vapor for about 60 minutes at 9cfm fog volume to support guidelines for semiconductor clean rooms and USP 797 Pharmaceutical in-situ airflow analysis.
Polystyrene Latex Spheres are produced as NIST Traceable polymer beads from 20 nanometers to 160 microns. Polystyrene Latex spheres are highly accurate size standards used to calibrate size accuracy of laser particle counters. PSL spheres are suspended in a DI Water solution at a specific size in an atomizer or nebulizer, which is used to create a particle aerosol with a narrow particle size distribution for calibration of laser particle counters.
Silica Nanoparticles are spherical and mixed in 15ml of Di Water solution with 10% concentration of Silica. CV is quite narrow with sizes provided from 20nm to 3 microns, providing a mono-disperse particle size distribution.
Silica Powder is available in bulk, dry powder from 200nm to 2 microns in 2 kilogram increments from 2 Kilo to 200 Kilos. Silica is used in CMP slurries, lens polishing, mesoporous silica nano-particles (MSN), Thin Film, Solar Cell Manufacturing and Nano-Composites.
Room Sanitizer is used to decontaminate a Compound Pharmacy, ISO Suite, sterile room and leaf plants in a room by saturating the area with an aerosol of hydrogen peroxide nano-droplets, evaporating to a vapor to contact every part of the room to kill off 99.9997% of bio-contamination.
VIDEO HIGHLIGHTS
  Cleanroom Ultrapure Fogger Clean Room Fogger Microbial Air Sampler  
Ultrapure Fogger Clean Room Fogger Microbial Air Sampler
Clean Room Fogger, DI Water Fogger, Model 2001 Fogger, Portable Fogger or AP32 Cleanroom Ultrapure Fogger is used in smoke studies of sterile rooms, barrier isolators and ISO suites, supporting USP 797 guidelines for insitu analysis of airflow, patterns and turbulence. The Microbial Air Sampler is used to monitor unwanted fungal and bacterial growth in ISO 5, ISO 7 and ISO 9 Filling Lines.
PRODUCT HIGHLIGHTS
 

Our 2300XP1 Particle Deposition System deposits PSL Spheres and silica nanoparticles to produce contamination Wafer Standards from 40 nanometers to 10 microns on Prime Silicon wafers, blank photo masks or your FILM WAFERS. We can deposit on glass substrates up to 285mm x 285mm, or special applications of 515 x 515mm glass substrates to support Rudolph tools. Contamination Wafer Standards are used for size calibration of KLA-Tencor Surfscan tools, such as surfscan SP1, Surfscan SP2, SP3, SP5, SPx, Surfscan 6420, 6220, 6200, Hitachi and Topcon SSIS wafer inspection systems. Calibration Wafer Standards using PSL Spheres are used to calibrate the size response curves on pattern and non-patterned wafer surface inspection systems. Silica nano-particles have nearly the same refractive index as PSL, thus Silica particle laser response is quite similar to PSL laser response. Silica particles are used to create Silica Contamination Wafer Standards to be scanned by wafer inspection systems for calibration of the size response curves on SEM tools, TEM systems, Surfscan SP2, SP3, SP5, SPx, Surfscan 6420, 6220, 6200, Hitachi and Topcon SSIS wafer inspection systems. PSL Spheres and Silica particles can be deposited on prime silicon wafers for size calibration of your SSIS tools. Wafer standards deposited with polystyrene latex spheres below 100nm are scanned by a KLA-Tencor Surfscan SP5.

The CRF-2 Clean Room Fogger is the lowest cost clean room fogger using DI Water or WFI Water to produce a pure fog at 9cfm for about 60 minutes. The CRF-2 uses a light weight, white, polypropylene enclosure to reduce costs. Ultrapure clean room foggers, also called nitrogen fog generators, produce the highest volume of ultra pure fog at 46cfm with the longest visual distances of 20-30 feet in the airflow for much longer periods of operation at 90 minutes.

Cleanroom Fogger, DI Water Fogger

Clean room Fogger There are a variety of cleanroom foggers used in smoke studies to visualize airflow and turbulence in Class 1 to 100,000 clean rooms, sterile rooms and ISO suites. The M2001 Fogger visualizes 10-15 feet of airflow with 15cfm of ultrapure fog for 35 minutes; while the Cleanroom Ultrapure Fogger, AP32 visualizes airflow much better at 20-30 feet with 46cfm of ultrapure fog for 90 minutes in smoke studies of ISO suites, sterile rooms and clean rooms. The CRF-2 Cleanroom Fogger, is a DI Water Fogger to visualize airflow with lower costs.

Clean Room Fogger, CRF-2 Information

Silica Contamination Wafer Standard and PSL Wafer Standard

Contamination Wafer Standard We produce Contamination Wafer Standards using PSL Spheres or Silica Nanoparticles on Prime Silicon Wafers or your FILM Wafers. NIST traceable, Contamination Wafer Standards and Calibration Wafer Standards are provided from 40nm to 10um particle size on 100mm to 450mm wafers to calibrate KLA-Tencor Surfscan, Topcon, ADE and Hitachi wafer inspection systems.

Calibration Wafer Standard Information

   

PSL Spheres, Polystyrene Latex Beads, Silica

PSL Spheres PSL Spheres and polystyrene latex beads typical 1% concentration in 15ml DI Water; or Surf-Cal, pre-mixed PSL Spheres.
Silica powder in 2Kg increments, Bulk, Dry Powder Silica for CMP slurries, nano-composites, high pressure liquid chromatography and mesoporous silica nanoparticles (MSN). Silica Nanoparticles in 15ml of DI Water Solution for size calibration from 20nm to 2 microns.

Silica Information

DryFog Room Sanitizer

Room SanitizerDry Fog, Room Sanitizer provides superb decontamination of bacterial and fungal growth in a compound pharmacy, as well as ISO 5, ISO 7 and ISO 9 Pharmaceutical suites. The Dry Fogger is designed to kill microbiological contamination in compound pharmacies, pharma ISO suites. Sanitizing Fogger creates an aerosol disinfectant, which evaporates to a vapor, coming in contact with any surface area (walls, equipment, floors, etc.) killing off fungi and bacteria. Sanitize a Compound Pharmacy.

Room Sanitizer, Room Decontamination Information

   

Cascade Impactor

Cascade Impactor Cascade Impactor provides sharp cut points for high resolution particle sampling from 10nm to 18um.

Condensation Particle Counter

Condensation Particle Counter Monitor and count unwanted aerosol particle contamination with water based, condensation particle counter in aerosol, high purity gas lines at 5nm and above with flowrates of 1 LPM and 3 LPM.